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Chip Design Software Stocks Surge After US Lifts Export Curbs on China

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Shares of major chip design software companies Synopsys and Cadence Design Systems rose sharply on Thursday following the U.S. government’s decision to lift export restrictions on chip design software exports to China, alleviating market uncertainties and preserving access to a critical revenue source.

Market Impact

  • The restrictions, introduced in late May, had cut off over 10% of revenue for these companies, negatively impacting forecasts and share prices.

  • Analysts from Mizuho noted the export resumption will limit revenue loss to just one month in the current quarter.

  • The easing of trade tensions could facilitate China’s approval of Synopsys’s $35 billion acquisition of engineering software firm Ansys, a deal pending regulatory clearance primarily in China.

Stock Movements

  • Synopsys shares rose 5.5%, despite ongoing assessments of export curbs’ financial impacts.

  • Cadence Design Systems surged 6.1%, reaching a record high of $330.09.

  • Ansys gained around 3.5%, while Germany’s Siemens, another key player in electronic design automation (EDA), rose 1.5%.

Expert Insights and Context

  • Susannah Streeter of Hargreaves Lansdown described the move as “a distinct warming of relations and a small ceasefire in the chips war.”

  • However, she cautioned that it does not represent a broad easing of restrictions on high-end chip exports, especially from companies like Nvidia.

  • U.S. concerns persist over China’s technological advancements and potential military applications of American chip technology.

  • The curbs have driven increased domestic chip design efforts in China, supported by state subsidies, raising fears of retaliatory actions that could affect regulatory decisions like the Synopsys-Ansys deal.

Deal Deadline

  • The Synopsys-Ansys merger has been cleared in all jurisdictions except China, with a closure deadline of July 15 and an option to extend to January next year.

U.S. Eases Chip Software and Ethane Export Curbs Amid China Trade Truce

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The United States has lifted export restrictions on chip design software and ethane to China, signaling further de-escalation of trade tensions between the world’s two largest economies. The move follows Beijing’s agreement to ease controls on rare earth exports—a key concession that helped maintain a fragile trade truce.

Restrictions Reversed

Leading electronic design automation (EDA) software firms—Synopsys, Cadence Design Systems, and Siemens—confirmed they are resuming sales and support for Chinese customers after receiving notification from the U.S. Department of Commerce that prior restrictions have been revoked.

  • Siemens announced Thursday it has restarted business operations in China, causing its shares to rise 1.7% after market opening.

  • Synopsys said it plans to restore customer access within three business days.

The EDA tools, essential for advanced semiconductor design, are dominated by these three firms, which together control over 70% of China’s market, according to Xinhua.

Ethane Export Curbs Also Rescinded

On the same day, the U.S. government also notified ethane producers that licensing requirements imposed in May and June had been withdrawn, allowing resumption of exports to China.

These curbs had been part of a broader U.S. response to China’s April suspension of rare earth exports, which had disrupted global supply chains for automakers, aerospace firms, chipmakers, and military contractors.

The Bigger Picture: Rare Earths for Rollbacks

According to a source familiar with the internal U.S. strategy, the Biden administration took a calculated step:

“The U.S. have escalated to de-escalate. They put restrictions on many more items in order to get the Chinese to back off on rare earths.”

Following negotiations, both sides reportedly confirmed a framework agreement in which:

  • China will review export applications for sensitive goods,

  • And the U.S. will roll back countermeasures imposed earlier this year.

China’s Commerce Ministry affirmed the arrangement last Friday, paving the way for what analysts describe as a return to February-March status quo.

Remaining Uncertainties

Despite the rollback on EDA tools and ethane, it remains unclear whether the U.S. has also lifted other strategic restrictions, including:

  • GE Aerospace’s license suspension for jet engine exports to COMAC’s C919 aircraft,

  • Or limitations on nuclear equipment suppliers selling to Chinese power plants.

The U.S. Department of Commerce has not yet commented on the latest developments.

Outlook

With both countries aiming to stabilize economic relations amid broader geopolitical tensions, more trade rollbacks could follow—particularly if the framework agreement holds. However, sector-specific restrictions tied to national security concerns are likely to remain or evolve in other forms.

SiCarrier Claims Its Tools Can Help China Develop Advanced Chips

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Chinese chip equipment maker Shenzhen SiCarrier Industry Machines asserted on Thursday that its domestically developed tools could enable China to manufacture advanced semiconductors, despite U.S. export controls on high-end chipmaking technology.

Speaking at the Semicon China industry fair, SiCarrier president Du Lijun noted that while China lacks access to advanced lithography systems due to U.S. trade restrictions, alternative non-optical technologies could be used to produce 5-nanometer (nm) chips. He acknowledged that multi-patterning techniques could increase manufacturing complexity and reduce yields but argued that they provide a viable path for China to progress beyond 7 nm chips.

SiCarrier, founded in 2022 and backed by a state investment fund, supplies major Chinese foundries such as Semiconductor Manufacturing International Corporation (SMIC) and reportedly collaborates with Huawei. The company was among 140 Chinese firms added to the U.S. trade blacklist in December 2023.

The firm’s multi-patterning approach, patented in late 2023, utilizes deep ultraviolet lithography (DUV) and self-aligned quadruple patterning (SAQP) to mimic certain EUV lithography capabilities while reducing costs. This strategy is seen as a potential workaround to Western restrictions on ASML’s extreme ultraviolet (EUV) machines.