A bipartisan group of U.S. lawmakers has proposed new legislation to tighten export restrictions on semiconductor manufacturing equipment destined for China, escalating efforts to maintain U.S. leadership in artificial intelligence.
The draft MATCH Act would expand controls on advanced chipmaking tools, directly impacting companies such as ASML and Nikon, which dominate key segments like deep ultraviolet (DUV) lithography systems.
The proposal specifically targets equipment used to produce advanced chips, aiming to block access for major Chinese firms including SMIC, Huawei and other leading domestic chipmakers.
Unlike previous export controls introduced through executive actions, this initiative originates in Congress and seeks to align restrictions across allied countries, ensuring foreign suppliers adhere to similar limitations as U.S. companies.
Currently, Dutch regulations already prevent ASML from exporting its most advanced chipmaking tools to China. However, the company continues to sell less advanced DUV systems. The proposed law would extend restrictions to cover these products as well, potentially cutting off a significant portion of China’s access to critical semiconductor equipment.
China has been a major market for ASML, accounting for roughly one-third of its sales in 2025, though this share is expected to decline. The proposed legislation underscores intensifying technological competition between the United States and China, particularly in strategic sectors such as AI and semiconductor manufacturing.